The global Extreme Ultraviolet Lithography (EUVL) market was valued at US$ 507.7 million in 2023 and is projected to reach US$ 1468.9 million by 2030, at a CAGR of 16.0% during the forecast period.
| Market size in 2023 | US$ 507.7 Million | Forecast Market size by 2030 | US$ 1468.9 Million |
|---|---|---|---|
| Growth Rate | CAGR of 16.0% | Number of Pages | 200+ Pages |
“Extreme ultraviolet lithography (EUVL)” is a leading next-generation lithography (NGL) technology used to print lines as small as 30nm and develop microprocessors and microchips. This technology may replace optical lithography, which is currently used to create microcircuits. The EUVL system operates by directing strong beams of ultraviolet light reflected from a circuit design pattern onto a silicon wafer.
EUVL systems utilize extremely short wavelength technology, which can be applied down to the 10nm node. However, three significant challenges must be addressed before mass production can occur: a light power source, resistance, and mask infrastructure.
EUVL is a forefront NGL technology capable of printing lines as small as 30nm, crucial for developing microprocessors and microchips. This method has the potential to supplant optical lithography, which is used for current microcircuits. The system functions by projecting intense beams of ultraviolet light, reflected from a circuit design pattern, onto a silicon wafer.
EUVL systems feature extremely short wavelength technology, applicable down to the 10nm node. However, for this approach to reach mass production, three key concerns must be resolved: a light power source, resistance, and mask infrastructure.
EUVL, one of the foremost next-generation lithography technologies, prints lines as narrow as 30nm to develop advanced microprocessors and microchips. This technology could replace the optical lithography used in today’s microcircuits. The EUVL system burns strong ultraviolet light beams reflected from a circuit design pattern onto a silicon wafer.
This research report provides a comprehensive analysis of the Extreme Ultraviolet Lithography (EUVL) market, focusing on the current trends, market dynamics, and future prospects. The report explores the global Extreme Ultraviolet Lithography (EUVL) market, including major regions such as North America, Europe, Asia-Pacific, and emerging markets. It also examines key factors driving the growth of Extreme Ultraviolet Lithography (EUVL), challenges faced by the industry, and potential opportunities for market players.
The global Extreme Ultraviolet Lithography (EUVL) market has witnessed rapid growth in recent years, driven by increasing environmental concerns, government incentives, and advancements in technology. The Extreme Ultraviolet Lithography (EUVL) market presents opportunities for various stakeholders, including Integrated device manufacturers (IDM), Foundry. Collaboration between the private sector and governments can accelerate the development of supportive policies, research and development efforts, and investment in Extreme Ultraviolet Lithography (EUVL) market. Additionally, the growing consumer demand present avenues for market expansion.
Key Features:
The research report on the Extreme Ultraviolet Lithography (EUVL) market includes several key features to provide comprehensive insights and facilitate decision-making for stakeholders.
- Executive Summary: The report provides overview of the key findings, market trends, and major insights of the Extreme Ultraviolet Lithography (EUVL) market.
- Market Overview: The report provides a comprehensive overview of the Extreme Ultraviolet Lithography (EUVL) market, including its definition, historical development, and current market size. It covers market segmentation by Type (e.g., Light Source, Mirrors), region, and application, highlighting the key drivers, challenges, and opportunities within each segment.
- Market Dynamics: The report analyses the market dynamics driving the growth and development of the Extreme Ultraviolet Lithography (EUVL) market. The report includes an assessment of government policies and regulations, technological advancements, consumer trends and preferences, infrastructure development, and industry collaborations. This analysis helps stakeholders understand the factors influencing the Extreme Ultraviolet Lithography (EUVL) market’s trajectory.
- Competitive Landscape: The report provides an in-depth analysis of the competitive landscape within the Extreme Ultraviolet Lithography (EUVL) market. It includes profiles of major market players, their market share, strategies, product portfolios, and recent developments.
- Market Segmentation and Forecast: The report segment the Extreme Ultraviolet Lithography (EUVL) market based on various parameters, such as by Type, region, and by Application. It provides market size and growth forecasts for each segment, supported by quantitative data and analysis. This helps stakeholders identify growth opportunities and make informed investment decisions.
- Technological Trends: The report should highlight the key technological trends shaping the Extreme Ultraviolet Lithography (EUVL) market, such as advancements in Type One technology and emerging substitutes. It analyses the impact of these trends on market growth, adoption rates, and consumer preferences.
- Market Challenges and Opportunities: The report identify and analyses the major challenges faced by the Extreme Ultraviolet Lithography (EUVL) market, such as technical bottleneck, cost limitations, and high entry barrier. It also highlights the opportunities for market growth, such as government incentives, emerging markets, and collaborations between stakeholders.
- Regulatory and Policy Analysis: The report should assess the regulatory and policy landscape for Extreme Ultraviolet Lithography (EUVL), including government incentives, emission standards, and infrastructure development plans. It should analyse the impact of these policies on market growth and provide insights into future regulatory developments.
- Recommendations and Conclusion: The report conclude with actionable recommendations for stakeholders, such as Application One Consumer, policymakers, investors, and infrastructure providers. These recommendations should be based on the research findings and address key challenges and opportunities within the Extreme Ultraviolet Lithography (EUVL) market.
- Supporting Data and Appendices: The report include supporting data, charts, and graphs to substantiate the analysis and findings. It also includes appendices with additional detailed information, such as data sources, survey questionnaires, and detailed market forecasts.
Market Segmentation
Extreme Ultraviolet Lithography (EUVL) market is split by Type and by Application. For the period 2019-2030, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value.
Market segment by Type
- Light Source
- Mirrors
- Mask
- Others
Market segment by End-user
- Integrated device manufacturers (IDM)
- Foundry
Global Extreme Ultraviolet Lithography (EUVL) Market Segment Percentages, By Region and Country, 2023 (%)
- North America (United States, Canada, Mexico)
- Europe (Germany, France, United Kingdom, Italy, Spain, Rest of Europe)
- Asia-Pacific (China, India, Japan, South Korea, Australia, Rest of APAC)
- The Middle East and Africa (Middle East, Africa)
- South and Central America (Brazil, Argentina, Rest of SCA)
Major players covered
- Carl Zeiss AG (Germany)
- TOPPAN Inc. (Japan)
- NTT Advanced Technology Corporation (Japan)
- KLA Corporation (US)
- ADVANTEST CORPORATION (Japan)
- ASML (Netherlands)
- Ushio Inc. (Japan)
- SUSS MicroTec SE (Germany)
- AGC Inc. (Japan)
- Photronics, Inc. (US)
- HOYA Corporation (Japan)
- TRUMPF (Germany)
- Rigaku Corporation (Japan)
- NuFlare Technology (Japan)
- Energetiq Technology Inc. (US)
- Park Systems (Korea)
- Zygo Corporation (US)
- Imagine Optic (US)
- Applied Materials, Inc. (US)
- Edmund Optics Ltd. (US)
- Lasertec Corporation (Japan)
Recent Developments
- ASML and Intel Collaboration: In January 2022, ASML announced the final phase of its collaboration with Intel Corporation, targeting the integration of High-NA (Numerical Aperture) lithography technology into semiconductor manufacturing by 2025. This collaboration includes Intel’s purchase order for ASML’s TWINSCAN EXE:5200 system, an advanced extreme ultraviolet (EUV) production system designed to process over 200 wafers per hour with a large numerical aperture.
- Carl Zeiss AG EUV Lithography Advancement: In December 2022, Carl Zeiss AG unveiled a specialized optical system designed exclusively for EUV lithography. This system operates within a vacuum environment and relies entirely on mirrors for its function. Standing approximately 1.5 meters tall and weighing around 3.52 tons, the system comprises over 35,200 individual components, marking a significant technological advancement in the field.
Key Drivers:
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Increasing demand for smaller, faster, and more powerful chips: The demand for smaller, faster, and more powerful chips is driving the adoption of EUVL, which enables the production of smaller and more complex chips.
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Adoption of EUVL by major chip manufacturers: Major chip manufacturers, such as TSMC and Samsung, have adopted EUVL for the production of advanced chips, which has driven the demand for this technology.
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Advances in EUVL technology: Advances in EUVL technology have improved its performance and reliability, which has driven the adoption of this technology.
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Increasing investment in EUVL: The increasing investment in EUVL by chip manufacturers and equipment suppliers has driven the development of this technology.
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Government support for EUVL: Governments around the world are supporting the development of EUVL as a key technology for the semiconductor industry, which has driven the growth of this market.
Restrains:
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High cost of EUVL equipment: EUVL equipment is very expensive, which can be a barrier to entry for some companies and organizations.
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Technical challenges: EUVL is a complex technology that faces several technical challenges, such as the need for high-quality mirrors and the management of heat and contamination, which can impact its performance and reliability.
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Limited availability of skilled personnel: The operation and maintenance of EUVL equipment require specialized skills, which can be difficult to find in some regions.
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Competition from alternative lithography technologies: The EUVL market may face competition from alternative lithography technologies, such as immersion lithography, which can offer similar benefits at a lower cost.
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Regulatory challenges: The EUVL market may face regulatory challenges, particularly in terms of ensuring that the equipment meets safety and quality standards.
