EUV Mask Defect Inspection Equipment Market Analysis:
The global EUV Mask Defect Inspection Equipment Market was valued at 1502 million in 2024 and is projected to reach US$ 3737 million by 2031, at a CAGR of 14.3% during the forecast period.
EUV Mask Defect Inspection Equipment Market Overview
Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.
EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.
At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.
In the semiconductor lithography process, corresponding light sources need to be used for different masks. Different mask applications vary greatly, and can be generally divided into binary masks, phase-shift masks and EUV masks. EUV Mask is a new type of mask designed specifically for EUV (extreme ultraviolet) lithography technology. Given the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). This type of mask is widely used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
At present, mask detection technology is mainly optical detection and SEM detection. Among them, the optical inspection companies are mainly Lasertec and KLA, while SEM inspection is Advantest. From the perspective of downstream applications, as long as the mask uses Pellicle, EUV Mask inspection equipment is required (in other words, as long as there is an EUV lithography machine, EUV inspection equipment must be used), but at present, not all EUV Masks of downstream terminal manufacturers will be used with Pellicle.
In DUV lithography or optical Mask technology, Pellicle plays a key role. The Mask inspection tool operates at an exposure wavelength of 193nm, and inspection is performed through this layer of film. For the wafer fab, this is a direct and efficient process. However, in extreme ultraviolet (EUV) lithography technology, the manufacturing process of the Mask needs to be carried out in a dedicated Mask workshop. At this point, the inspection of the Mask becomes more complicated because it requires a high-resolution system. In the wafer fab environment, the ideal situation is to use a layer of Pellicle to protect the Mask from particle contamination, while allowing the inspection system to work through this layer of Pellicle. If there are no defects, you can proceed; if defects are detected, you need to remove the pellicle and send the Mask to the Mask workshop for cleaning.
EUV Mask defect detection equipment is mainly used in Mask Shop and Fab. The Fab includes the mask production line and the wafer manufacturing production line. For the Fab, there are two main reasons for using EUV Mask defect detection equipment. First, once the pellicle is attached to the Mask, other types of equipment (such as electron beam or DUV equipment) except EUV detection equipment are difficult to achieve high-sensitivity detection effects.
The EUV (Extreme Ultraviolet) Mask Defect Detection Equipment market plays a crucial role in ensuring the quality and yield of advanced semiconductor manufacturing.
Key Market Insights:
Pellicle Limitation:
Pellicles interfere with defect detection, making it difficult for traditional tools to identify microscopic defects accurately.Technology Shift:
EUV detection tools offer higher accuracy compared to DUV methods, capable of identifying smaller particles and defects.Application Distribution:
Mask Shops held 61% market share in 2023
With growing adoption of advanced nodes, Fabs’ share is projected to rise to 42% by 2030
Market Structure:
Highly Monopolized:
Dominated by KLA and Lasertec
Both companies produce high-precision tools with long delivery times (e.g., Lasertec: 2 years)
Outlook:
With continued advancements in semiconductor nodes and rising demand for EUV lithography, the EUV mask defect detection equipment market will maintain strong growth, though it will remain monopolized by a few players in the near term.
MARKET MONITOR GLOBAL, INC (MMG) has surveyed the EUV Mask Defect Inspection Equipment manufacturers, suppliers, distributors, and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks
This report aims to provide a comprehensive presentation of the global market for EUV Mask Defect Inspection Equipment, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding EUV Mask Defect Inspection Equipment. This report contains market size and forecasts of EUV Mask Defect Inspection Equipment in global, including the following market information:
- Global EUV Mask Defect Inspection Equipment market revenue, 2020-2025, 2026-2031, ($ millions)
- Global EUV Mask Defect Inspection Equipment market sales, 2020-2025, 2026-2031, (Units)
- Global top five EUV Mask Defect Inspection Equipment companies in 2024 (%)
EUV Mask Defect Inspection Equipment Key Market Trends :
Rapid Growth in Advanced Node Adoption
The increasing use of 5nm, 3nm, and 2nm process nodes in chip manufacturing is driving higher demand for precise EUV mask defect inspection equipment.Monopolization by Key Players
The market is currently dominated by KLA and Lasertec, who are expected to retain their stronghold due to high R&D investment and long delivery cycles.Growing Role of EUV Lithography
EUV lithography is becoming the cornerstone for high-end semiconductor production, boosting the necessity for advanced defect detection systems.Increased Fab-Level Deployment
While Mask Shops still dominate usage, Fabs are increasingly integrating EUV inspection equipment to manage pellicle-related inspection requirements.High Precision Optical Detection Technologies
Optical detection—especially bright field and dark field techniques—is evolving rapidly to meet EUV’s ultra-sensitive defect detection standards.
EUV Mask Defect Inspection Equipment Market Regional Analysis :
North America:
Strong demand driven by EVs, 5G infrastructure, and renewable energy, with the U.S. leading the market.
Europe:
Growth fueled by automotive electrification, renewable energy, and strong regulatory support, with Germany as a key player.
Asia-Pacific:
Dominates the market due to large-scale manufacturing in China and Japan, with growing demand from EVs, 5G, and semiconductors.
South America:
Emerging market, driven by renewable energy and EV adoption, with Brazil leading growth.
Middle East & Africa:
Gradual growth, mainly due to investments in renewable energy and EV infrastructure, with Saudi Arabia and UAE as key contributors.
Total Market by Segment:
Global EUV Mask Defect Inspection Equipment market, by Type, 2020-2025, 2026-2031 ($ millions) & (Units)
Global EUV Mask Defect Inspection Equipment market segment percentages, by Type, 2024 (%)
- 5-7nm Process
- 3nm and Below Process
Global EUV Mask Defect Inspection Equipment market, by Application, 2020-2025, 2026-2031 ($ Millions) & (Units)
Global EUV Mask Defect Inspection Equipment market segment percentages, by Application, 2024 (%)
- Mask Shop
- Fab
Competitor Analysis
The report also provides analysis of leading market participants including:
- Key companies EUV Mask Defect Inspection Equipment revenues in global market, 2020-2025 (estimated), ($ millions)
- Key companies EUV Mask Defect Inspection Equipment revenues share in global market, 2024 (%)
- Key companies EUV Mask Defect Inspection Equipment sales in global market, 2020-2025 (estimated), (Units)
- Key companies EUV Mask Defect Inspection Equipment sales share in global market, 2024 (%)
Further, the report presents profiles of competitors in the market, key players include:
- Lasertec
- KLA-Tencor
- Advantest
Market Drivers
Growing Demand for Smaller Process Nodes
As the semiconductor industry aggressively moves toward advanced nodes like 3nm and below, the need for precise EUV mask inspection becomes critical for ensuring yield and performance.Rising Adoption of EUV Lithography Machines
The proliferation of EUV lithography in commercial chip manufacturing boosts the demand for inspection equipment compatible with EUV mask characteristics.Quality Control Requirements in High-End Chip Manufacturing
Ensuring defect-free mask patterns is essential in advanced IC production. This drives the adoption of sophisticated detection systems to maintain product integrity.
Market Restraints
High Cost of Equipment and Long Delivery Cycles
EUV mask inspection equipment is capital-intensive with delivery times as long as two years, limiting rapid adoption by smaller players.Complex Maintenance and Operational Requirements
The high-precision nature of EUV tools makes them complex to maintain, requiring specialized environments and skilled operators.Limited Number of Equipment Providers
Market monopolization by just a few players (KLA, Lasertec) restricts competition and may hinder pricing flexibility for end-users.
Market Opportunities
Expansion of EUV Mask Usage in Commercial Fabs
As advanced nodes become mainstream, more fabs will adopt EUV inspection tools, expanding the potential customer base.Technological Innovations in Optical and SEM Inspection
Ongoing innovations in defect detection—especially hybrid optical-SEM solutions—offer new avenues for accuracy and speed.Increased Focus on In-Fab Mask Monitoring
With fabs aiming for real-time inspection and faster feedback, integrating EUV detection systems directly into production lines becomes an attractive opportunity.
Market Challenges
Detection Through Pellicles
Accurately inspecting masks with pellicles in place remains a technological hurdle due to interference and resolution constraints.Data Handling and Analysis Complexity
High-resolution inspection generates vast amounts of data, requiring advanced analytics and processing capabilities.Lack of Standardization in EUV Mask Handling
Variations in pellicle usage and mask types across fabs complicate the development of one-size-fits-all detection solutions.
FAQs
Q: What are the key driving factors and opportunities in the EUV Mask Defect Inspection Equipment market?
A: Key drivers include the growing demand for advanced semiconductor nodes (3nm and below), the rise of EUV lithography, and the need for high-precision defect inspection. Opportunities lie in fab-level integration and innovations in detection technologies.
Q: Which region is projected to have the largest market share?
A: Asia-Pacific, particularly Taiwan and South Korea, is expected to lead the market due to high investments in advanced chip manufacturing and strong presence of major fabs.
Q: Who are the top players in the global EUV Mask Defect Inspection Equipment market?
A: The key market players are KLA and Lasertec, who dominate the global market with cutting-edge technologies and long-standing industry partnerships.
Q: What are the latest technological advancements in the industry?
A: Advances include improved bright field/dark field optical inspection, SEM-based detection integration, and better defect detection through pellicles in EUV environments.
Q: What is the current size of the global EUV Mask Defect Inspection Equipment market?
A: The global market was valued at US$ 1,502 million in 2024 and is projected to reach US$ 3,737 million by 2031, growing at a CAGR of 14.3%.
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