Quinas Technology Ltd has reached a significant milestone in the development of its ULTRARAM non-volatile memory technology by leveraging advanced atomic-scale processing at KAUST Core Labs.

The company has integrated atomic layer etching (ALE) solutions from Oxford Instruments Plasma Technology, enabling sub-nanometer precision and ultra-low-damage fabrication. This level of control is essential for engineering the complex quantum well structures that form the foundation of ULTRARAM.

ULTRARAM technology combines the high-speed performance of DRAM with the data retention capabilities of non-volatile memory, offering strong potential for improved energy efficiency and system-level performance in next-generation computing applications.

James Ashforth-Pook, CEO and co-founder of Quinas, states that “atomic-scale control of the company’s quantum well structures is fundamental to ULTRARAM.” “Quinas have access to one of the most cutting-edge and reliable environments for low-damage semiconductor R&D in the world by working with KAUST Core Labs and utilising Oxford Instruments’ atomic layer etching technology.”

This milestone highlights Quinas’ expanding global R&D strategy and reinforces its position in advancing innovative memory solutions, while also emphasizing the growing role of international collaboration in semiconductor research and development.

According to Dr. Kenneth Kennedy, director of the KAUST Nanofabrication Core Lab, “KAUST Core Labs support cutting-edge semiconductor research through advanced nanofabrication facilities and atomic-scale processing tools designed for low-damage device development.”

Harriet van der Vliet, head of strategic R&D markets at OIPT, says that “atomic layer etching allows for precise, low-damage fabrication of nanoscale device features and is becoming more common in advanced semiconductor research and production environments around the world.”

“Plasma Technology has been working with KAUST for a long time and has sold them a number of ALE and atomic layer deposition (ALD) systems, including the PlasmaPro ASP, which is the newest in ALD technology.”

Explore the Newest Related Research Insights Available for You: https://semiconductorinsight.com/report/global-atomic-layer-etching-system-market/